Linux Based OPC/RET Development Tool - LithoWare - KLA-Tencor

KLA-Tencor’s LithoWare, a Linux-based OPC/RET Development tool, reduces time-to-production by allowing customers to co-optimize the RET (resolution enhancement techniques) and the process conditions simultaneously. RET engineers can use LithoWare to optimize their OPC (optical proximity correction) at the same time they explore lithography conditions such as the latest photoresists,  illumination and post-exposure bake. Engineers will be able to create an RET recipe quickly and ensure it works across the entire process window.

Edward Charrier, KLA-Tencor, said:

Since standard full-chip RET/OPC production models have very limited illumination predictability and don't support process changes on the fly, they require a lengthy and expensive sequence of mask fabrication, wafer printing, measurement and model calibration that can take days, weeks or even months. LithoWare allows engineers to get it right the first time by providing a unique 'what-if' exploration capability which can optimize large numbers of process and RET variables on the fly…

LithoWare's Linux-based architecture also leverages customers' existing computer investments, with no need for additional hardware. Linux environment give engineers the ability to perform advanced computational lithography and explore an extended set of process parameters. LithoWare is already being used at IC companies in both the US and Japan to enhance their RET development productivity.

Key feature of LithoWare Linux-based OPC/RET development tool:

• OPC/process co-optimization is included reducing your process and OPC development time and effort.
• Resist process predictions to understand real lithography performance and enable more-optimum process and OPC selection.
• Runtime speedup enabled with distributed computing.
• Increases your experimental coverage and reduce your turn around time with no re-calibration between process conditions.
• Integrates seamlessly into your EDA workflow, complementing existing tools.

LithoWare OPC/RET development tool allows users to load GDSII files, select multiple simulation regions, conduct OPC decoration interactively by changing illuminations on the fly, and output an OPC-decorated mask clip as a GDSII file.

LithoWare provides RET/OPC engineers and designers with a tool that is very easy to use compared to conventional tools. This can cut cycle times since RET/OPC engineers or designers can quickly check whether their designs or new ideas contain lithography violations.

KLA-Tencor will demonstrate LithoWare OPC/RET development tool at the upcoming Design Automation Conference (June 4-9) in San Diego.

Further reading: KLA-Tencor - Linux Based OPC/RET Development Tool