High-Resolution Nanopositioning and Scanning System - P-733.3CD - Physik Instrumente
Posted in Measurement, Instrumentation, Chip, SemiconductorOn Friday, August 3, 2007
Physik Instrumente (PI) introduced its new P-733.3CD, a high-resolution XYZ nano-positioning & scanning system designed for high resolution microscopy, materials research, imaging and ultra precision alignment applications. The P-733.3CD nanopositioning & scanning system features parallel-kinematics design, which reduces the moved mass, and enables higher operating speeds than other piezo scanning stages.
Physik Instrumente P-733.3CD Nano-positioning and Scanning System
The piezo systems of P-733.3CD provide a positioning and scanning range of 100×100×10 µm together with sub-nanometer resolution. The high-speed Z-axis can actively compensate out-of-plane, Z-axis deviation during XY scans, important for AFM applications. The large clear aperture is an advantage in transmitted-light applications.
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The position is measured without physical contact using capacitive sensors. In combination with the positioning resolution of well under 1 nm, makes it possible to achieve very high levels of linearity. A further advantage of direct metrology with capacitive sensors is the high phase fidelity and the high bandwidth of up to 10 kHz. The closed-loop resolution is 0.3 nm for the X and Y axes and 0.2 nm for the optional Z-axis.
In a parallel kinematics multiaxis system, all actuators act directly on the same moving platform. This means that all axes see the same moved mass and can be designed with identical dynamic properties. Parallel kinematics systems have additional advantages over serially stacked systems, including more-compact construction, no cumulative error from the different axes and no moving cables to cause friction that degrades resolution and linearity. Parallel kinematics systems can be operated with up to six degrees of freedom with low inertia and excellent dynamic performance.
Multiaxis nanopositioning systems equipped with both parallel kinematics and direct metrology are able to measure platform position in all degrees of freedom against a common, fixed reference: i.e. parallel metrology. In such systems, undesirable motion from one actuator in the direction of another (cross-talk) is detected immediately and actively compensated by the servo-loops. Known as Active Trajectory Control Concept, the parallel kinematics/parallel metrology combination can keep deviation from a trajectory to under a few nanometers, even in dynamic operation.
Application of P-733.3CD nanopositioning & scanning system includes:
- Scanning microscopy
- Nanopositioning
- Image processing / stabilization
- Biotechnology
- Metrology / Interferometry
- Semiconductor testing
- Micromanipulation
- Mask / wafer positioning
More info: PI Nanopositioning and Scanning System
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