Common Platform Alliance Announced the 45nm DFM (Design For Manufacturing) Models

IBM, Chartered and Samsung, three companies of Common Platform technology alliance announced the availability of design-for-manufacturing (DFM) technology models, data files and design kits from leading EDA and DFM companies, supporting Common Platform technology at 45nm. The 45nm DFM offering for Common Platform technology supports a wide range of capabilities, which address the critical manufacturing-related issues from design to mask making.

The Common Platform
IBM, Chartered and Samsung Electronics have broken new ground in the semiconductor industry with a unique collaboration focused on leading-edge, jointly developed digital CMOS process technologies and advanced manufacturing. The Common Platform model is further supported by a comprehensive ecosystem of design enablement and implementation partners from the EDA, IP and design services industries. This ecosystem allows foundry customers to source their chip designs to multiple 300mm foundries with minimal design work, unprecedented flexibility and choice. The Common Platform model features 90nm, 65nm, 45nm and 32nm technologies.

While continuing to support existing capabilities from multiple companies previously announced at 65nm, the Common Platform companies have enabled additional tools, including DFM tools from Mentor Graphics that perform critical area analysis (CAA) and critical feature analysis (CFA) and a silicon-validated CMP Predictor from Cadence Design Systems.

The move to 45nm requires even greater cooperation across multiple tool suppliers, and to address this challenge and better serve customers, the Common Platform companies are driving unprecedented industry collaboration and integration of design solutions and are demonstrating cross-vendor tool integration at DAC.

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